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TaN-Tantalum nitride

  • Molecular weight : 194.9
  • Colour: gray
  • Nitrogen content: ≥6.8
  • Density: 13.4g/m3
  • Melting point: 3090℃
  • Boiling point: 4800℃
■ Specifications

Production information:

Tantalum Nitride (TaN) has excellent physical, chemical and mechanical properties (such as high hardness, wear resistance, chemical inertness, thermal stability and low temperature coefficient of resistance), and is widely used in wear-resistant coatings, thin film resistors and integrated circuits Diffusion barriers and other fields in China.

Performance character:

1.High purity: the highest purity can reach 99.99%, XRD detect no impurity phase.

 

■ Technical Data
 
TaN-technical parameter
 
 
TaN-2021.07.02第二次氮化
TaN-2020.12.03

 

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Carbide series
Nitride series
Boride series
Silicide series
Elemental metal series
Nano material series
Oxide series
3D print&thermal spray series
Hot Products product is same as per standard ISO354(DIN1494)
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